金属热处理 ›› 2025, Vol. 50 ›› Issue (8): 144-149.DOI: 10.13251/j.issn.0254-6051.2025.08.023

• 工艺研究 • 上一篇    下一篇

固溶处理对半导体加工设备用6061铝合金阳极氧化性能的影响

莫灼强1,2,3, 莫肇月1,2,3, 任月路1,2,3, 杨旭4, 何杰5, 雷浩成1,2,3, 叶文韬2   

  1. 1.广西南南铝航空交通铝合金新材料与应用研究院, 广西 南宁 530031;
    2.广西南南铝加工有限公司, 广西 南宁 530031;
    3.广西铝合金材料与加工重点实验室, 广西 南宁 530031;
    4.北方华创微电子装备有限公司, 北京 100176;
    5.中国科学院金属研究所, 辽宁 沈阳 110016
  • 收稿日期:2025-04-29 修回日期:2025-06-03 出版日期:2025-08-25 发布日期:2025-09-10
  • 通讯作者: 莫肇月,高级工程师,E-mail:mozy0623@163.com
  • 作者简介:莫灼强(1985—),男,高级工程师,博士,主要研究方向为铝合金新材料及铝加工技术,E-mail:gyzx98gb@163.com。
  • 基金资助:
    广西重点研发计划(桂科AB24010273);中央引导地方科技发展资金项目(桂科ZY21195036)

Effect of solution treatment on anodic oxidation property of 6061 aluminum alloy used in semiconductor processing equipment

Mo Zhuoqiang1,2,3, Mo Zhaoyue1,2,3, Ren Yuelu1,2,3, Yang Xu4, He Jie5, Lei Haocheng1,2,3, Ye Wentao2   

  1. 1. Guangxi Alnan Institute of Aerospace Transit Aluminum Alloy and Application, Nanning Guangxi 530031, China;
    2. Guangxi Alnan Aluminum Fabrication Co., Ltd., Nanning Guangxi 530031, China;
    3. Guangxi Key Laboratory of Materials and Processes of Aluminum Alloys, Nanning Guangxi 530031, China;
    4. Beijing Naura Microelectronics Equipment Co., Ltd., Beijing 100176, China;
    5. Institute of Metal Research, Chinese Academy of Sciences, Shenyang Liaoning 110016, China
  • Received:2025-04-29 Revised:2025-06-03 Online:2025-08-25 Published:2025-09-10

摘要: 利用光学显微镜、扫描电镜、维氏硬度计、耐压测试仪等研究了不同温度固溶及时效后半导体加工设备用6061铝合金的显微组织、力学性能和阳极氧化性能。结果表明,不同固溶温度下,合金的强度、硬度和导电率无明显差异,但在520 ℃和530 ℃下固溶处理会导致固溶不充分,出现了数量较多的Mg2Si相,且宏观表现出较差的阳极氧化效果,其氧化膜耐5%盐酸腐蚀的时间<4 h,耐击穿电压<640 V.DC/mil,显微硬度也低于400 HV0.1。在540~560 ℃下固溶处理,合金的力学性能和阳极氧化性能均符合使用要求。试验高洁净6061铝合金中抑制晶粒长大的元素含量偏低,第二相数量偏少,在560 ℃×2 h固溶处理容易使晶粒粗化,存在阳极氧化花斑不良的风险。综合力学性能和阳极氧化性能,最优的热处理工艺为(540~550) ℃×2 h固溶+170 ℃×12 h时效。

关键词: 铝合金, 半导体加工设备, 阳极氧化, 固溶工艺, 耐击穿电压

Abstract: Microstructure, mechanical properties and anodic oxidation properties of 6061 aluminum alloy used in semiconductor processing equipment after solution treatment at different temperatures and aging were studied by means of optical microscope, scanning electron microscope, Vickers hardness tester, pressure tester, etc. The results show that, there is no significant difference in the strength, hardness and conductivity of the alloy at different solution treatment temperatures. But when solution treated at 520 ℃ and 530 ℃, insufficient solid solution occurs, a large number of Mg2Si phases appear, the macro anodic oxidation effect is poor, and the oxidation film resistance time of 5% hydrochloric acid corrosion is less than 4 h, breakdown voltage resistance is less than 640 V.DC/mil, microhardness is lower than 400 HV0.1. When solution treated at 540-560 ℃, the mechanical properties and anodic oxidation properties of the alloy can meet the using requirements. The content of elements that inhibit grain growth in tested high-purity 6061 aluminum alloy is relatively low, the number of second phase is small, the solution treatment at 560 ℃ for 2 h is easy to make the grain coarsen, so that the risk of poor anodic oxidation spots is high. Combining mechanical properties and anodic oxidation properties, the optimal heat treatment process is (540-550) ℃×2 h+170 ℃×12 h.

Key words: aluminum alloy, semiconductor processing equipment, anodic oxidation, solution treatment, breakdown resistance voltage

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