(MoW)0.5(TiZrTa)0.5高熵合金表面金刚石薄膜的制备及其耐蚀性

doi:10.13251/j.issn.0254-6051.2026.02.048

金属热处理 ›› 2026, Vol. 51 ›› Issue (2): 319-325.DOI: 10.13251/j.issn.0254-6051.2026.02.048

(MoW)_0.5(TiZrTa)_0.5高熵合金表面金刚石薄膜的制备及其耐蚀性

孙洁¹, 梁金伟¹, 赵炯¹, 陈思凡¹, 孙绍恒², 王永胜¹, 于盛旺¹

1.太原理工大学材料科学与工程学院, 山西太原 030024;
2.国网电力工程研究院有限公司, 北京 100054

收稿日期:2025-09-18 修回日期:2025-12-11 发布日期:2026-03-05
通讯作者: 王永胜,副教授,博士,E-mail:wangyongsheng@tyut.edu.cn
作者简介:孙洁(1998—),男,硕士研究生,主要研究方向为涂层及腐蚀防护,E-mail:sunjie0289@link.tyut.edu.cn。
基金资助:
山西省水利科学技术研究与推广项目(2025GM13);山西省归国留学人员科研基金(2024-057)

Preparation and corrosion resistance of diamond films on (MoW)_0.5(TiZrTa)_0.5 high entropy alloy

Sun Jie¹, Liang Jinwei¹, Zhao Jiong¹, Chen Sifan¹, Sun Shaoheng², Wang Yongsheng¹, Yu Shengwang¹

1. College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan Shanxi 030024, China;
2. State Grid Electric Power Engineering Research Institute Co., Ltd., Beijing 100054, China

Received:2025-09-18 Revised:2025-12-11 Published:2026-03-05

摘要/Abstract

摘要： 采用微波等离子体化学气相沉积法(MPCVD)在(MoW)_0.5(TiZrTa)_0.5高熵合金表面沉积金刚石薄膜,并对其耐蚀性进行了研究。SEM及XRD结果发现:沉积10 min时,试样表面未形成连续金刚石薄膜,且晶粒尺寸较小;沉积20 min时,试样表面金刚石连续成膜,最大晶粒尺寸约为400 nm;沉积30 min时,试样表面形成尺寸达10~20 nm的连续纳米金刚石薄膜。沉积金刚石薄膜试样结构均由金刚石薄膜、碳化物层和高熵合金组成,其中,碳化物包括MoC₍₁₀₃₎、Mo₂C₍₁₀₁₎和W₂C₍₁₀₁₎等。电化学测试结果表明:沉积10 min试样由于未形成连续薄膜导致耐腐蚀性能较差;沉积20 min试样的耐腐蚀性能最好,具有最小自腐蚀电流密度(4.752×10^-7 A/cm²)和最大的极化电阻(134.860 kΩ),且自腐蚀电位达到-0.286 V(vs SCE);沉积30 min试样由于产生纳米金刚石相导致缺陷和晶界增多,晶间腐蚀加剧,耐腐蚀性能较沉积20 min试样有所下降。

关键词: 高熵合金, 金刚石薄膜, 化学气相沉积, 耐腐蚀性能

Abstract: The diamond films were deposited on the surface of (MoW)_0.5(TiZrTa)_0.5 high entropy alloy by microwave plasma chemical vapor deposition (MPCVD), and their corrosion performance were investigated. The results of SEM and XRD reveal that when deposited for 10 min, no continuous diamond film is formed on the surface of the specimen, and the grain size is relatively small. When deposited for 20 min, a continuous diamond film is formed on the surface of the specimen, with a maximum grain size of about 400 nm. When deposited for 30 min, a continuous nano-diamond film is formed on the surface of the specimen, with a size of 10-20 nm. The structure of the diamond films deposited specimens consists of diamond films, carbide layers, and a high-entropy alloys, in which the carbides include MoC₍₁₀₃₎, Mo₂C₍₁₀₁₎ and W₂C₍₁₀₁₎, etc. The electrochemical test results show that the corrosion resistance of the specimen deposited for 10 min is poor due to the lack of continuous film formation. The corrosion resistance of the specimen deposited for 20 min is the best, with the minimum self corrosion current density (4.752×10^-7 A/cm²) and the maximum polarization resistance (134.860 kΩ), and the self corrosion potential reaches -0.286 V(vs SCE). The specimen deposited for 30 min has more defects and grain boundaries due to the generation of nano-diamond phase, and intergranular corrosion is intensified, resulting in a decrease in corrosion resistance compared to the specimen deposited for 20 min.

Key words: high entropy alloy, diamond film, chemical vapor deposition, corrosion resistance

中图分类号:

TG142

孙洁, 梁金伟, 赵炯, 陈思凡, 孙绍恒, 王永胜, 于盛旺. (MoW)_0.5(TiZrTa)_0.5高熵合金表面金刚石薄膜的制备及其耐蚀性[J]. 金属热处理, 2026, 51(2): 319-325.

Sun Jie, Liang Jinwei, Zhao Jiong, Chen Sifan, Sun Shaoheng, Wang Yongsheng, Yu Shengwang. Preparation and corrosion resistance of diamond films on (MoW)_0.5(TiZrTa)_0.5 high entropy alloy[J]. Heat Treatment of Metals, 2026, 51(2): 319-325.

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(MoW)_0.5(TiZrTa)_0.5高熵合金表面金刚石薄膜的制备及其耐蚀性

Preparation and corrosion resistance of diamond films on (MoW)_0.5(TiZrTa)_0.5 high entropy alloy

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(MoW)0.5(TiZrTa)0.5高熵合金表面金刚石薄膜的制备及其耐蚀性

Preparation and corrosion resistance of diamond films on (MoW)0.5(TiZrTa)0.5 high entropy alloy

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(MoW)_0.5(TiZrTa)_0.5高熵合金表面金刚石薄膜的制备及其耐蚀性

Preparation and corrosion resistance of diamond films on (MoW)_0.5(TiZrTa)_0.5 high entropy alloy