金属热处理 ›› 2025, Vol. 50 ›› Issue (5): 228-235.DOI: 10.13251/j.issn.0254-6051.2025.05.035

• 工艺研究 • 上一篇    下一篇

偏压对HiPIMS制备DLC薄膜结构与性能的影响

吴勇1,2, 刘书洋1,2, 陈辉1,2, 陶冠羽1,2,3, 杜建融1,2, 张钰1,2   

  1. 1.中国机械总院集团武汉材料保护研究所有限公司, 湖北 武汉 430030;
    2.特种表面保护材料及应用技术国家重点实验室, 湖北 武汉 430030;
    3.武汉理工大学 汽车工程学院, 湖北 武汉 430070
  • 收稿日期:2024-12-16 修回日期:2025-03-06 发布日期:2025-06-25
  • 通讯作者: 陈 辉,高级工程师,博士,E-mail:chenjiahao87@126.com
  • 作者简介:吴 勇(1962—),男,研究员,主要研究方向为表面热处理及铝化物涂层,E-mail:ywurimp@sina.com。
  • 基金资助:
    国家科技重大专项(2023ZY01064)

Effect of bias voltage on structure and properties of DLC film prepared by HiPIMS

Wu Yong1,2, Liu Shuyang1,2, Chen Hui1,2, Tao Guanyu1,2,3, Du Jianrong1,2, Zhang Yu1,2   

  1. 1. China Academy of Machinery Wuhan Research Institute of Materials Protection Co., Ltd., Wuhan Hubei 430030, China;
    2. State Key Laboratory of Special Surface Protection Materials and Application Technology, Wuhan Hubei 430030, China;
    3. School of Automotive Engineering, Wuhan University of Technology, Wuhan Hubei 430070, China
  • Received:2024-12-16 Revised:2025-03-06 Published:2025-06-25

摘要: 采用高功率脉冲磁控溅射(HiPIMS)技术,在硬质合金YG8基体表面沉积TiAlSiN过渡层,并在0~-300 V的偏压下制备了类金刚石(DLC)薄膜。利用Raman光谱、XPS、SEM表征薄膜的组织结构与微观形貌,采用纳米压痕、划痕法、摩擦磨损试验研究薄膜的力学性能。结果表明,随着负偏压的增加,DLC薄膜的ID/IG值先减小后增大,G峰半高宽先增大后减小,-200 V制备的薄膜ID/IG值最小、G峰半高宽最大,sp3键含量最高,达到58.0%。不同偏压下DLC薄膜的截面形貌均无明显柱状结构,特别是偏压为-200 V与-300 V时,薄膜呈现致密的类玻璃态结构。不同偏压下薄膜的硬度(H)、相对弹性模量(E*)、H/E*H3/E*2与sp3含量变化趋势基本一致,偏压为-200 V时,薄膜的综合力学性能最佳,硬度与相对弹性模量分别为23.91 GPa与260.45 GPa,H/E*H3/E*2分别为0.0918与0.2016 GPa。不同偏压下DLC薄膜的划痕形貌表明,-100 V与-200 V制备的DLC薄膜表现出优异的结合强度,临界载荷Lc2≥80 N。摩擦试验表明,DLC薄膜具有优异的摩擦学性能。特别是-200 V下沉积的DLC薄膜具有最低的平均摩擦因数与最低的磨损率,分别为0.09与5.75×10-16 m3/(N·m)。

关键词: 高功率脉冲磁控溅射(HiPIMS), 类金刚石薄膜, 基体偏压, 组织结构, 力学性能

Abstract: Diamond-like carbon (DLC) film was deposited via high power impulse magnetron sputtering (HiPIMS) technology at bias voltage range between 0 to -300 V. The microstructure of the film was characterized by using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM). The mechanical properties of the film were investigated through the utilization of nanoindentation, scratch and friction and wear tests. The results demonstrate that with the increase of negative bias voltage, the ID/IG value of DLC film initially decreases and then increases, the full width at half maximum of G peak(FWHM(G)) initially increases and then decreases, and the ID/IG value of the film prepared with bias voltage of -200 V is the smallest, the FWHM(G) is the largest, and the sp3 bond content is the highest, reaching 58.0%. The section morphology of the DLC film at different bias voltages exhibits no discernible columnar structure, particularly at bias voltages of -200 V or -300 V, where the film displays a dense glass-like structure. The hardness (H), relative elastic modulus (E*), H/E*, H3/E*2 and sp3 contents of the film under different bias voltage are essentially comparable, at bias voltage of -200 V, the film exhibits the optimal comprehensive mechanical properties, with hardness and relative elastic modulus of 23.91 GPa and 260.45 GPa, respectively. The values of H/E* and H3/E*2 are 0.0918 and 0.2016 GPa, respectively. The scratch morphologies of the DLC films at different bias voltages demonstrate that films prepared with -100 V and -200 V exhibit excellent adhension strength, with a critical load (Lc2) of at least 80 N. Additionally, the friction tests indicate that the DLC films possess excellent tribological properties. In particular, the film deposited at -200 V exhibits the lowest average friction coefficient(0.09) and the lowest wear rate (5.75×10-16 m3/(N·m)).

Key words: high power impulse magnetron sputtering (HiPIMS), diamond-like carbon film, substrate bias voltage, microstructure, mechanical properties

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