钨表面WTaVNbMo难熔高熵合金层的组织与性能

doi:10.13251/j.issn.0254-6051.2023.05.002

金属热处理 ›› 2023, Vol. 48 ›› Issue (5): 6-11.DOI: 10.13251/j.issn.0254-6051.2023.05.002

钨表面WTaVNbMo难熔高熵合金层的组织与性能

黄天阳¹, 郑家圣¹, 田林海^1,2, 林乃明¹, 王振霞¹, 秦林¹, 吴玉程³

1.太原理工大学材料科学与工程学院, 山西太原 030024;
2.山西电子科技学院(筹)新能源与材料工程学院, 山西临汾 041000;
3.合肥工业大学材料科学与工程学院, 安徽合肥 230009

收稿日期:2022-10-10 修回日期:2023-03-03 出版日期:2023-05-25 发布日期:2023-06-21
通讯作者: 田林海,教授,博士,E-mail: tianlinhai@ tyut.edu.cn
作者简介:黄天阳(1997—),男,硕士研究生,主要研究方向为薄膜材料及表面工程,E-mail:18955059797@163.com。
基金资助:
国家自然科学基金(52020105014)

Microstructure and properties of WTaVNbMo refractory high-entropy alloy layer on W surface

Huang Tianyang¹, Zheng Jiasheng¹, Tian Linhai^1,2, Lin Naiming¹, Wang Zhenxia¹, Qin Lin¹, Wu Yucheng³

1. School of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan Shanxi 030024, China;
2. School of New Energy and Materials Engineering, Shanxi Electronic Science and Technology Institute (Preparation), Linfen Shanxi 041000, China;
3. School of Materials Science and Engineering, Hefei University of Technology, Hefei Anhui 230009, China

Received:2022-10-10 Revised:2023-03-03 Online:2023-05-25 Published:2023-06-21

摘要/Abstract

摘要： 采用双层辉光等离子表面冶金技术,以粉末冶金W₁₈Ta₁₈V₂₀Nb₁₈Mo₂₆合金作为源极靶材,控制工件极温度为1200 ℃,源极和阴极电压差分别为300、400和500 V,在纯钨表面制备了WTaVNbMo难熔高熵合金层。用扫描电镜及其所附能谱仪和X射线衍射仪检测合金层的显微组织和相组成,用显微硬度计和电化学工作站测试了合金层的硬度和耐蚀性,利用SRIM软件模拟分析了合金层的抗辐照性能。结果表明,在不同电压差条件下纯钨表面均形成了BCC结构的WTaVNbMo高熵合金层。电压差为400 V时,制备的合金层厚度达到100 μm以上;500 V电压差下制备的合金层表面均匀,组织致密,硬度最高,可以达到1635 HV0.05,耐蚀性良好,自腐蚀电流密度较W基体降低了近两个数量级。辐照模拟结果表明,相比于纯钨,高熵合金层的损伤范围较为集中,投影射程更短,电子阻止本领更大,电离损失速度加快。

关键词: 高熵合金层, 双辉等离子表面冶金技术, 硬度, 耐蚀性, 辐照模拟

Abstract: WTaVNbMo refractory high-entropy alloy layers were prepared on the surface of pure tungsten by double-glow plasma surface metallurgy technology with powder metallurgy W₁₈Ta₁₈V₂₀Nb₁₈Mo₂₆ alloy as source target. The temperature of workpiece was 1200 ℃, and the voltage difference between the source and cathode was 300 V, 400 V and 500 V, respectively. The microstructure and phase composition of the alloy layers were examined by scanning electron microscope with attached energy dispersive spectrometer and X-ray diffractometer. The hardness and corrosion resistance of the alloy layers were tested by microhardness tester and electrochemical workstation. The irradiation resistance of the alloy layer was simulated by SRIM software. The results show that the WTaVNbMo high-entropy alloy layers with BCC structure are formed on the surface of pure tungsten under different voltage differences. When the voltage difference is 400 V, the thickness of alloy layer is more than 100 μm. The alloy layer prepared under voltage difference of 500 V has uniform surface, compact structure and the highest hardness, which can reach 1635 HV0.05. The corrosion resistance is good, and the self-corrosion current density decreases by nearly two orders of magnitude compared with that of the W substrate. The irradiation simulation results show that compared with pure tungsten, the damage range of the high-entropy alloy layer is more concentrated, the projected range is shorter, the electronic stopping power is greater, and the ionization loss rate is faster.

Key words: high-entropy alloy layer, double-glow plasma surface metallurgy technology, hardness, corrosion resistance, irradiation simulation

中图分类号:

TG146.4

黄天阳, 郑家圣, 田林海, 林乃明, 王振霞, 秦林, 吴玉程. 钨表面WTaVNbMo难熔高熵合金层的组织与性能[J]. 金属热处理, 2023, 48(5): 6-11.

Huang Tianyang, Zheng Jiasheng, Tian Linhai, Lin Naiming, Wang Zhenxia, Qin Lin, Wu Yucheng. Microstructure and properties of WTaVNbMo refractory high-entropy alloy layer on W surface[J]. Heat Treatment of Metals, 2023, 48(5): 6-11.

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钨表面WTaVNbMo难熔高熵合金层的组织与性能

Microstructure and properties of WTaVNbMo refractory high-entropy alloy layer on W surface

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