退火温度对直流磁控溅射制备Ru薄膜微观结构及膜基结合力的影响
薛雅平1,3，鞠洪博1，陈敏2，郭丽萍2，喻利花1，许俊华1
Effect of annealing temperature on microstructure and adhesion strength of Ru films deposited by DC magnetron sputtering
Xue Yaping1,3, Ju Hongbo1, Chen Min2, Guo Liping2, Yu Lihua1, Xu Junhua1
金属热处理
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2016, (6): 125
-127
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DOI: 10.13251/j.issn.0254-6051.2016.06.028