活性屏等离子体源渗氮距离对2Cr13钢渗层组织与性能的影响
李广宇, 黄俊杰, 栾媛, 张翠, 雷腾, 许伊婷
Effect of nitriding distance of active screen plasma source on microstructure and properties of 2Cr13 steel nitrided layer
Li Guangyu, Huang Junjie, Luan Yuan, Zhang Cui, Lei Teng, Xu Yiting
金属热处理
.
2025, (4): 270
-276
.
DOI: 10.13251/j.issn.0254-6051.2025.04.042